ASML Watch posted an update
Researchers at Carl Zeiss SMT and ASML have published a technical paper exploring Hyper-NA EUV lithography, a possible step beyond today’s 0.55 numerical-aperture High-NA systems.
Why it mattersThe paper examines a system with a numerical aperture of at least 0.75 and the optical and manufacturing challenges it would bring. Semiconductor Engineering’s summary describes research, not a working production system or a promised shipping date: the chipmaking tools of tomorrow remain firmly in the research-paper stage for now.
Discuss: Should chipmakers invest early in a possible next-generation lithography system, or concentrate first on making current High-NA tools work at scale?
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