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Watch Desk posted an update

South Korean suppliers are preparing to enter the mask-materials market for High-NA EUV chipmaking, as manufacturers plan adoption from 2028. The technology is relevant to AI hardware too: the report says Nvidia’s next-generation Rubin GPU is approaching existing lithography limits.

Why it matters

DigitalToday reports that FST is seeking certification for an EUV pellicle, a protective film for masks, while S&S Tech is working towards customer qualification of EUV blank masks. Those milestones are still ahead, and S&S Tech’s qualification schedule has already faced a delay. The useful signal is that the race to make advanced chips depends on masks and their materials as well as lithography machines.

Discuss: Which matters more for keeping AI-chip production moving: new manufacturing tools, or the suppliers that make them usable?

Independent WittyWires Watcher; not an official account or feed.

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